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Design and optimization of a retinal flux density meter
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CONTRIBUTORS:
Author
:
Van Derlofske, John
(b. 1968, d. ----)
Author
:
Bierman, Andrew
(
Rensselaer Polytechnic Institute
)
Author
:
Rea, Mark S.
(
Rensselaer Polytechnic Institute
)
Author
:
Ramanath, Janani
Author
:
Bullough, John D.
(
Rensselaer Polytechnic Institute
)
JOURNAL:
Measurement Science and Technology
, 13(6), 821 - 828.
YEAR:
2002
PUB TYPE:
Journal Article
SUBJECT(S):
photometry, photopic, scotopic, mesopic
DISCIPLINE:
Engineering and Applied Sciences
HTTP:
http://www.iop.org/EJ/S/UNREG/abstract/0957-0233/13/6/301/
LANGUAGE:
English
PUB ID:
103-384-257 (
Last edited on
2004/06/17 12:25:21 GMT-6
)
SPONSOR(S):
ABSTRACT:
None
STATISTICS
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